Chemical Wetbench General (BULK processes) is used for oxide clean/ Si etch of samples containing metals including gold.
Si etch using KOH/TMAH with Gold contamination, nitride/ oxide etching of samples containing metal or processed in PECVD without chamber clean.
The Chemical Wetbench Solvent/bases has 5 different acid baths to do dedicated processes. The bench is also fitted with a dump rinser and dryer. The baths are capable of processing cut pieces to 25 full 6 inch wafers simultaneously.
