Chemical Wetbench General (BULK processes) - level 3

Equipment Category: 

Chemical Wetbench General (BULK processes) is used for oxide clean/ Si etch of samples containing metals including gold.

Si etch using KOH/TMAH with Gold contamination, nitride/ oxide etching of samples containing metal or processed in PECVD without chamber clean.

  • Bath1 – Oxide etch
  • Bath2 – Nitride etch
  • Bath 3 - 40% KOH (potassium hydroxide) at 800C
  • Bath 4 - 5% TMAH (potassium hydroxide) at 750C
  • Bath 5- Piranha clean

The Chemical Wetbench Solvent/bases has 5 different acid baths to do dedicated processes. The bench is also fitted with a dump rinser and dryer. The baths are capable of processing cut pieces to 25 full 6 inch wafers simultaneously.

Timing: Every Wednesday morning - 10.00am - 12.00 noon
 
Material: Piranha cleaning and RCA cleaning, Safety and disposal instructions
 
Maintenance slot: Every Monday morning 10.00am - 12.00 noon
 
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