Chemical Wet bench Solvent/basesis used for solvent clean/ Si etch of samples coming from lithography or other level 4 equipment’s (PV Lab Samples)
Chemical Wet bench Acids is used for Piranha Cleaning/ HF dip/ Metal/Metal oxide etching of LEVEL 4 samples coming from lithography or other level 4 equipment’s (PV Lab Samples).
Chemical Wetbench Acid clean is used for cleaning up to 6 inch full, unprocessed silicon wafers.
Chemical Wetbench Solvent/bases is used for solvent clean/ Si etch of samples coming from lithography or other level 3 equipments.
Chemical Wetbench HF Vapor Phase Etcher is used for striction free silicon dioxide etching in microfabrication.
Chemical Wetbench General (BULK processes) is used for oxide clean/ Si etch of samples containing metals including gold.
Chemical wet bench Solvents/ bases semi-clean is used for solvent clean and Si etch of cut pieces to full 4 inch wafers.
Chemical wet bench Acid semi-clean is used for processing substrates coming from/ going to Level 2 equipments.
Chemical wet bench Acid Metal is used for processing substrates with metals or exposed to metals.
Chemical wet bench Acid clean is used for cleaning of unprocessed, new cut pieces to full 4 inch Si wafers.
