The Dektak XT surface profiler is an advanced thin and thick film step height, roughness and 2D stress measurement tool.

The Solartron Analytical Modulab instrument has variety of applications including electrochemical water splitting, photovoltaic IV measurements, and also electrochemical impedance of both solids and solutions. It is an advanced machine for a variety of applications such as super capacitors, fuel cells and batteries.

Ellipsometer measures a change in polarization as light reflects or transmits from a material structure. The polarization change is represented as an amplitude ratio, Ψ, and the phase difference, Δ. The measured response depends on optical properties and thickness of individual materials. Thus, Ellipsometer is primarily used to determine film thickness and optical constants. However, it is also applied to characterize composition, crystallinity, roughness, doping concentration, and other material properties associated with a change in optical response.

A four point probe is a simple apparatus for measuring the resistivity of semiconductor samples. By passing a current through two outer probes and measuring the voltage through the inner probes allows the measurement of the substrate resistivity

Ellipsometer measures a change in polarization as light reflects or transmits from a material structure. The polarization change is represented as an amplitude ratio, Ψ, and the phase difference, Δ. The measured response depends on optical properties and thickness of individual materials. Thus, Ellipsometer is primarily used to determine film thickness and optical constants. However, it is also applied to characterize composition, crystallinity, roughness, doping concentration, and other material properties associated with a change in optical response.

MDPmap is a compact bench top contactless tool for measuring parameters like carrier lifetime, photoconductivity, resistivity and defect information over a wide injection range in steady state or short pulse excitation (μ-PCD). Automated sample recognition and parameter setup allows an easy adaption to a big variety of different samples comprising epitaxial layers and wafers after various preparation stages ranging from as-grown wafers to up to 95% metallized ones

The Ultra-Scan uses a 2D laser array to map the two-dimensional curvature of semiconductor wafers, optical mirrors, lenses, or practically any polished surface. The system also provides quantitative film stress analysis with full area map scan for wafers by first scanning the bare substrate and then re-scanning the sample post-process.

Differential interference contrast and high-performance fluorescence capability of the microscope can be used to study various properties of the sample.

The SourceMeter combines a precise, low-noise, highly stable DC power supply with a low-noise, highly repeatable, high-impedance multimeter. It has 0.012% basic accuracy with 5H-digit resolution.

Phenom XL G2 is a tabletop SEM equipped with Feild Emission Source of material CeB6. Tool is highly suitable for quick imaging with either Optical or Electron Beam with sample loading time of less than 5 seconds and 60 seconds respectively.

Zeiss Gemini 500 is a Schottky field emitter filament equipped Scanning Electron Microscopy. Imaging is possible for sample dimension from 5mm to 100mm diameter wafer.