Chemical Wet Bench Acid Clean - Level 1

Equipment Category: 
Wet Processing

Chemical wet bench Acid clean is used for cleaning of unprocessed, new cut pieces to full 4 inch Si wafers.

RCA/piranha of non-preprocessed (new) & wafers going into First nano furnaces, oxide and oxynitride etch of samples only from First nano furnaces or RTP2.

Quartzware and PP petridishes for processing substrates going to/ coming from Level 1 equipments.

Timing: Every Wednesday 2.30 pm - 4.00 pm
 
Material: Piranha cleaning and RCA cleaning, Safety and disposal instructions
 
Maintenance slot: Every Monday morning 10.00am - 12.00 noon
 
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(c) National Nanofabrication Centre, CeNSE, IISc, 2018.