Chemical Wetbench Solvent/ bases - Level 3

Equipment Category: 

Chemical Wetbench Solvent/bases is used for solvent clean/ Si etch of samples coming from lithography or other level 3 equipments.

All processes using Acetone, IPA or methanol. This bench is for metal liftoff, Litho mask cleaning and KOH silicon etch (LEVEL 3), Separate glassware for processing substrates containing Gold.

  • Bath1 – Acetone clean
  • Bath2 – IPA clean

The Chemical Wetbench Solvent/bases has 2 different solvent baths to do dedicated cleans. Also, it has petridishes and ultrasonic bath for lift off process. Heater and beakers are provided for KOH etch of cut pieces. The bench is also fitted with a dump rinser and dryer. The baths are capable of cleaning 25 full 6 inch wafers simultaneously.

Timing: Every Wednesday 2.30 pm - 4.00 pm
Material: Piranha cleaning and RCA cleaning, Safety and disposal instructions
Maintenance slot: Every Monday morning 10.00am - 12.00 noon
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