Laurell Spin Processor is used to distribute Photoresist in a unifrom layer by spinning a Substrate. This spin processor is used for all E-Beam Photoresists only.
Laurell Spin Processor is used to distribute Photoresist in a unifrom layer by spinning a Substrate. This spin processor is used for only Negative Photoresists and PDMS.
Laurell Spin Processor is used to distribute Photoresist in a unifrom layer by spinning a Substrate. This spin processor is used for only Positive Photoresists.
