Spin coaters

Laurell Spin Processor 3

Model:WS-650MZ-23NPP, S.No:11615

Laurell Spin Processor is used to distribute Photoresist in a unifrom layer by spinning a Substrate. This spin processor is used for all E-Beam Photoresists only.

Laurell Spin Processor 2

(Model: WS-650MZ-23NPP, S.No:11615)

Laurell Spin Processor is used to distribute Photoresist in a unifrom layer by spinning a Substrate. This spin processor is used for only Negative Photoresists and PDMS.

Laurell Spin Processor 1

(Model:WS-650MZ-23NPP, S.No:11615)

Laurell Spin Processor is used to distribute Photoresist in a unifrom layer by spinning a Substrate. This spin processor is used for only Positive Photoresists.

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