Chemical wet bench Solvents/ bases semi-clean - level 2

Equipment Category: 

Chemical wet bench Solvents/ bases semi-clean is used for solvent clean and Si etch of cut pieces to full 4 inch wafers.

All processes using Acetone, IPA or methanol. Allows stripping of photoresist from non-metal contaminated samples and Si etch using TMAH.

Quartzware and PP pertidishes for processing substrates going to/ coming from Level 2 or Level 1 equipments.

Timing: Every Wednesday morning - 10.00am - 12.00 noon
Material: Piranha cleaning and RCA cleaning, Safety and disposal instructions
Maintenance slot: Every Monday morning 10.00am - 12.00 noon
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