Chemical wet bench Solvents/ bases semi-clean is used for solvent clean and Si etch of cut pieces to full 4 inch wafers.
All processes using Acetone, IPA or methanol. Allows stripping of photoresist from non-metal contaminated samples and Si etch using TMAH.
Quartzware and PP pertidishes for processing substrates going to/ coming from Level 2 or Level 1 equipments.
