In-house Development

Tempress Three Stacked Furnace

Tempress Three Stacked Furnace dedicated for dielectric annealing and Oxidation, at the temperatures ranges between (350°C to1000°C). The process is carried out at atmospheric pressures.

Tempress Single Stack Furnace

Tempress Single Stack Furnace dedicated for metal annealing at temperatures from 350°C to1000°C at atmospheric pressures.

Critical Point Drier (CPD)

Critical Point Drying(CPD) is used for anti striction and dried release of delicate MEMS/NEMS structure after wet etch in a most beneficial method using Liquid Carbon dioxide(LCO2) at gaseous state.

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