Chemical Wetbench Acid Clean (BULK processes) - Level 1

Equipment Category: 

Chemical Wetbench Acid clean is used for cleaning up to 6 inch full, unprocessed silicon wafers.

RCA/ Piranha of full, unprocessed wafer going into First Nano Level 1 furnaces. The cleans performed here are high quality; final cleans which precede high temperature processing. 

  •  Bath1 - Piranaha cleaning
  •  Bath2 - RCA1 cleaning
  •  Bath3 - RCA2 cleaning
  •  Bath4 - 50:1 HF
  •  Dump rinsing
  •  Drying

The CMOS pre cleaning bench has 4 different acid baths to do dedicated processes.  Also, it has a dump rinser and dryer to avoid the physical contaminants. The baths are capable of cleaning 25 full 6 inch wafers simultaneously.

Timing: Every Wednesday morning - 10.00am - 12.00 noon
 
Material: Piranha cleaning and RCA cleaning, Safety and disposal instructions
 
Maintenance slot: Every Monday morning 10.00am - 12.00 noon
 
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