Chemical Wet bench Acids is used for Piranha Cleaning/ HF dip/ Metal/Metal oxide etching of LEVEL 4 samples coming from lithography or other level 4 equipment’s (PV Lab Samples).
Piranha, RCA, Etching
It has dedicated petridishes and Magnetic stirrer with heater. The bench is also fitted N2 dryer.
Book the slot and log in to the slot.
How to apply – Apply from FOM:
Timing: Any working Time during the week.
Safety and disposal instructions
