Chemical Wet bench Solvent/basesis used for solvent clean/ Si etch of samples coming from lithography or other level 4 equipment’s (PV Lab Samples)
All processes using Acetone, IPA or methanol. This bench is for metal liftoff, Litho mask cleaning and KOH silicon etch (LEVEL 4)
It has petridishes and ultrasonic bath for lift off process. Heater and beakers are provided for KOH etch of cut pieces. The bench is also fitted N2 dryer.
Book the slot and log on to the slot.
How to apply – Apply from FOM:
Timing: Any working Time during the week.
Safety and disposal instructions