Diener - Plasma Asher

Dry Etch

Ashing tool for ashing resists and other polymeric materials.

•Ashing resist like PMMA, MaN, S1813, AZ4562 AZ5214E etc
•Processing small pieces up to 4 inch wafers
•Descum process to remove any undeveloped regions or residues from the patterned regions
•O2 plasma treatment for activating surface



Resist            

Resist Thickness  (~nm)

Etch Rate  (~nm/min)

AZ5214e

1500

250

AZ4562

6200

250

MaN2403

360

260

PMMA950A4

200

600
  • RF powered Bottom electrode : 600W @ 13.56MHz
  • Gases : O2 , Ar, N2 , CF4 .
  • Pressure: Pressure from 0.35mbar to 0.12mbar

(c) National Nanofabrication Centre, CeNSE, IISc, 2018.