Mask Aligner EVG620 NT

Lithography

EVG620NT, the newest mask aligner to be added to NNFC's optical Lithography bay incorparates NIL technology in addition to mask alignment

  • Minimum feature size of 1um (lines/spaces with standard quartz mask)
  • Auto alignment option for topside and backside
  • Alignment accuracy - TSA (auto) <1um

                                               BSA (auto) <1um

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(c) National Nanofabrication Centre, CeNSE, IISc, 2018.