Laurell Spin Processor 3

Lithography
Spin coaters

Model:WS-650MZ-23NPP, S.No:11615

Laurell Spin Processor is used to distribute Photoresist in a unifrom layer by spinning a Substrate. This spin processor is used for all E-Beam Photoresists only.

  • Standard Chuck: 50-150mm Wafers and Glass Slides
  • Maximum RPM: 12000
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It is not required to apply any separate Training Slot for the Spin Processor. Users will be Trained on this automatically by applying for Training Online on any other Instruments available in Class 100.

Click below link for online training form. 

Cleanroom Equipment Training Form

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(c) National Nanofabrication Centre, CeNSE, IISc, 2018.