Chemical Wetbench Acid clean is used for cleaning up to 6 inch full, unprocessed silicon wafers.
RCA/ Piranha of full, unprocessed wafer going into First Nano Level 1 furnaces. The cleans performed here are high quality; final cleans which precede high temperature processing.
The CMOS pre cleaning bench has 4 different acid baths to do dedicated processes. Also, it has a dump rinser and dryer to avoid the physical contaminants. The baths are capable of cleaning 25 full 6 inch wafers simultaneously.
