Chemical wet bench Acid Metal - Level 3

Equipment Category: 
Wet Processing

Chemical wet bench Acid Metal is used for processing substrates with metals or exposed to metals.

Piranha/Metal etching/oxide etching of samples containing metal or processed in PECVD/ any LEVEL 3 equipment, Electroplating of Gold, Separate glassware for processing substrates containing Gold, Cleaning of glass slides.

  1. Bath1 - Piranaha cleaning
  2. Bath2 – Al etching
  3. Bath3 - Au etching
  4. Bath4 - Cr etching
  5. Bath 5 – oxide etching

The Chemical wet bench Acid Metal has 5 different acid baths to do dedicated processes . Also, it has a dump rinser and dryer to avoid the physical contaminants. The baths are capable of cleaning 25 full 6 inch wafers simultaneously.

Timing: Every Wednesday 2.30 pm - 4.00 pm
 
Material: Piranha cleaning and RCA cleaning, Safety and disposal instructions
 
Maintenance slot: Every Monday morning 10.00am - 12.00 noon
 
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(c) National Nanofabrication Centre, CeNSE, IISc, 2018.