Chemical wet bench Acid semi-clean - Level 2

Equipment Category: 
Wet Processing

Chemical wet bench Acid semi-clean is used for processing substrates coming from/ going to Level 2 equipments.

RCA/piranha of post-processed wafers from equipments in Level 2, oxide and nitride etching of samples processed in PECVD after chamber clean, samples from lithography which is not contaminated by metals.

  • Bath1 – RCA 1 cleaning
  • Bath2 – Nitride etching 85% Orthophosphoric acid
  • Bath3 - Oxide etching
  • Bath4 - 50:1 HF
  • Bath 5 – RCA 2

The Chemical wet bench Acid Metal has 5 different acid baths to do dedicated processes. Also, it has a dump rinser and dryer to avoid the physical contaminants. The baths are capable of cleaning 25 full 6 inch wafers simultaneously.

Timing: Every Wednesday 2.30 pm - 4.00 pm

Material: Piranha cleaning and RCA cleaning, Safety and disposal instructions

Maintenance slot: Every Monday morning 10.00am - 12.00 noon

Cleanroom Equipment Training Form

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(c) National Nanofabrication Centre, CeNSE, IISc, 2018.