Nanoimprint tool - Eitre 6

Obducat EITRE 6 is a semiautomatic NIL tool allowing replications in micro and nano ranges.

Capable of performing simultaneous thermal and UV NIL (STU) process
Imprint of 70 nm pillars achieved with less than 15 nm of residual layer
IPS usage increases the lifetime of master stamp (without contaminating the structures

Specification	Minimum	Maximum
Substrate	1 inch wafer	6 inch wafer
Temperature (°c)	20	200
Pressure (bar)	0	80
UV source	365 nm
Heating System	20°c/min
Cooling system	30°c/min
Alignment accuracy	1um (In pre optimized substrates)

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