Electron Beam Lithography (EBL) allows users to write patterns with extremely high resolution, smaller than 10nm in size. It makes use of a highly energetic, tightly focused electron beam, which is scanned over a sample coated with an electron-sensitive resist. The electron beam scans the image according to a pattern defined on a CAD file. The sample is then developed in an appropriate solvent which reveals the structures defined into the resist. This acts as a mold for subsequent pattern transfer techniques such as dry etching or metal lift-off. Due to the high-resolution nature of the technique, EBL has a vast range of applications including, but not limited to, nano-electronics, photonics, plasmonics, nano-fluidics, MEMS, x-ray and neutron optics.
NNfC has world class e-beam lithography facility with class 100 clean room and expertise in patterning of sub-20nm features.
Compact Electron Beam Lithography system with Thermal Field Emission technology
Capable of sub 20nm lithography
Maximum accelerating voltage 30kV and 7 apertures
Morphology and Cross – section of various samples can be analysed
Perfectly suited for write and view applications of samples with 2” area
Cleanroom Equipment Training Form
Day: Every "Monday and Wednesday" in a Week.
Timings: 10 AM to 1 PM.
Prerequisite for Training on Electron Beam Lithography tools - Raith Pioneer and e-Line Training Charges - Rs. 10,000 (will be sent along with monthly invoice). On completion of the training - first 4 slots booked would be free of charge. Users must fill in the Cleanroom Equipment Training Form for online training form inorder to get trained on Raith Pioneer and the Users will receive a conformation mail regarding the Date and Time of the Training conducted on the earliest possible Day from the Date User has applied for Training
Training Rules: